Product Description:

The mini-pleats V-shape HEPA filter the filtration surface area by 40–60% within the same frame size. This lowers initial air resistance to 90–200 Pa at 0.45 m/s face velocity, reducing energy consumption by up to 40%

Thermal and Chemical Resilience

Withstands continuous operation at ≤80°C (up to 250°C for specialized models) and resists humidity (≤100% RH). Materials like borosilicate glass fiber minimize outgassing, ideal for semiconductor/pharma applications

High Dust-Holding Capacity

Deep pleats (40–75 mm) trap particulates efficiently, extending service life to 12–18 months—ideal for high-particulate settings like manufacturing

Corrosion-Resistant Framing

Anodized aluminum or galvanized steel frames with powder-coated guard nets protect against chemical exposure and mechanical stress

Features:

• Mini-pleated V-shaped HEPA filters excel through structural efficiency (self-supporting pleats), energy economy (low resistance), and adaptive durability (custom frames/temperature tolerance). Their design balances high particulate capture with lifecycle cost savings, making them pivotal in critical environments like semiconductor fabs . For technical validations, refer to ISO 14644-3 leak testing protocols
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Technical Parameters:

Customization:

the anodized aluminum frame resists corrosion from cleaning agents like isopropyl alcohol and peracetic acid used during maintenance cycles.

Hydrophobic borosilicate glass fiber media prevent moisture absorption, ensuring stable performance under high-humidity conditions (up to 60% RH) common in EUV lithography areas.

Each filter undergoes rigorous DOP/PAO scanning per IEST-RP-CC034.1 to verify integrity before installation. In high-throughput fabs producing 3D NAND or DRAM,

the extended dust-holding capacity of V-pleat filters allows service intervals of 12–18 months, reducing downtime and contamination risks during changeouts.

Their modular compatibility with standard FFU grids enables rapid deployment and scalability during facility expansions. Furthermore, low outgassing materials ensure no volatile organic compounds (VOCs) interfere with sensitive photoresist chemistry.

As node sizes shrink below 3 nm, particle control becomes exponentially more critical, making V-shaped HEPA filters a foundational element in yield